A. Tritchkov: search on Z-Library

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1

SPIE Proceedings [SPIE 31st European Mask and Lithography Conference - Eindhoven, Netherlands (Monday 22 June 2015)] 31st European Mask and Lithography Conference - Enabling the 14nm node contact patterning using advanced RET solutions

Behringer, Uwe F.W., Finders, Jo, Zeggaoui, N., Landie, G., Villaret, A., Farys, V., Yesilada, E., Tritchkov, A., Word, J.

Year:

2015

Language:

english

File:

PDF, 863 KB

english, 2015

2

An efficient approach for computing residual stresses in welded joints

Shahram Sarkani, Vesselin Tritchkov, George Michaelov

Journal:

Finite Elements in Analysis and Design

Year:

2000

Language:

english

File:

PDF, 1.17 MB

english, 2000

3

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Optical Microlithography XI - Reduction of mask-induced CD errors by optical proximity correction

Randall, John, Tritchkov, Alexander V., Jonckheere, Rik M., Jaenen, Patrick, Ronse, Kurt G., Van den Hove, Luc

Year:

1998

Language:

english

File:

PDF, 428 KB

english, 1998

4

SPIE Proceedings [SPIE SPIE Photomask Technology - San Jose, California, United States (Monday 12 September 2016)] Photomask Technology 2016 - Comparing curvilinear vs Manhattan ILT shape efficacy on EPE and process window

Kasprowicz, Bryan S., Buck, Peter D., Zhang, Dan, Buck, Peter, Tritchkov, Alexander, Madhusudhan, Saikiran, Word, James

Year:

2016

Language:

english

File:

PDF, 824 KB

english, 2016

5

Sub-resolution feature OPC as an enabler for manufacturing at 0.2μm and below

J. Randall, A. Tritchkov, K. Ronse, P. Jaenen

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 360 KB

english, 1998

6

Use of positive and negative chemically amplified resists in electron-beam direct-write lithography

Year:

1995

Language:

english

File:

PDF, 1.19 MB

english, 1995

7

Directed self-assembly graphoepitaxy template generation with immersion lithography

Ma, Yuansheng, Lei, Junjiang, Andres Torres, J., Hong, Le, Word, James, Fenger, Germain, Tritchkov, Alexander, Lippincott, George, Gupta, Rachit, Lafferty, Neal, He, Yuan, Bekaert, Joost, Vanderberghe

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2015

Language:

english

File:

PDF, 4.17 MB

english, 2015

8

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 24 February 2013)] Optical Microlithography XXVI - Introducing a novel flow to estimate challenges encountered while transitioning from RET development to manufacturable solution

Cheng, Jacky, Conley, Will, Chia, Robin, Gong, Ying, ElSewefy, Omar, Chua, GekSoon, Foong, YeeMei, Dave, Aasutosh, Chua, Alvin, Zhang, DongQing, Liubich, Vlad, Lacour, Pat, Tritchkov, Alex

Year:

2013

Language:

english

File:

PDF, 667 KB

english, 2013

9

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 24 February 2013)] Optical Microlithography XXVI - Effective model-based SRAF placement for full chip 2D layouts

Jayaram, Srividya, Conley, Will, LaCour, Pat, Word, James, Tritchkov, Alexander

Year:

2013

Language:

english

File:

PDF, 1.25 MB

english, 2013

10

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Alternative Lithographic Technologies VII - Directed self-assembly (DSA) grapho-epitaxy template generation with immersion lithography

Resnick, Douglas J., Bencher, Christopher, Ma, Yuansheng, Lei, Junjiang, Torres, J. A., Hong, Le, Word, James, Fenger, Germain, Tritchkov, Alexander, Lippincott, George, Gupta, Rachit, Lafferty, Neal,

Year:

2015

Language:

english

File:

PDF, 2.10 MB

english, 2015

11

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - EUV implementation of assist features in contact patterns

Panning, Eric M., Goldberg, Kenneth A., Jiang, Fan, Raghunathan, Ananthan, Burkhardt, Martin, Saulnier, Nicole, Tritchkov, Alexander, Jayaram, Srividya, Word, James

Year:

2016

Language:

english

File:

PDF, 1.17 MB

english, 2016

12

SPIE Proceedings [SPIE 29th European Mask and Lithography Conference - Dresden, Germany (Tuesday 25 June 2013)] 29th European Mask and Lithography Conference - Model-based SRAF solutions for advanced technology nodes

Jayaram, Srividya, LaCour, Pat, Word, James, Tritchkov, Alexander, Behringer, Uwe F. W., Maurer, Wilhelm

Year:

2013

Language:

english

File:

PDF, 2.63 MB

english, 2013

13

SPIE Proceedings [SPIE Photomask Japan 2014 - Yokohama, Japan (Tuesday 15 April 2014)] Photomask and Next-Generation Lithography Mask Technology XXI - Use of ILT-based mask optimization for local printability enhancement

Kato, Kokoro, Tritchkov, Alexander, Kobelkov, Sergey, Rodin, Sergei, Sakajiri, Kyohei, Egorov, Evgueni, Woo, Soung-Su

Year:

2014

Language:

english

File:

PDF, 2.89 MB

english, 2014

14

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Controlling bridging and pinching with pixel-based mask for inverse lithography

Sanchez, Martha I., Ukraintsev, Vladimir A., Kobelkov, Sergey, Tritchkov, Alexander, Han, JiWan

Year:

2016

Language:

english

File:

PDF, 1.46 MB

english, 2016

15

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Design for Manufacturability through Design-Process Integration - Double pattern EDA solutions for 32nm HP and beyond

Bailey, George E., Wong, Alfred K. K., Singh, Vivek K., Tritchkov, Alexander, Park, Jea-Woo, Hong, Le, Wiaux, Vincent, Hendrickx, Eric, Verhaegen, Staf, Xie, Peng, Versluijs, Janko

Year:

2007

Language:

english

File:

PDF, 1.24 MB

english, 2007

16

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Optical Microlithography XXIX - Ultimate 2D resolution printing with negative tone development

Erdmann, Andreas, Kye, Jongwook, Burkhardt, Martin, Xu, Yongan, Tsai, Hsinyu, Tritchkov, Alexander, Mellmann, Jörg

Year:

2016

Language:

english

File:

PDF, 1.02 MB

english, 2016

17

Electron beam / DUV intra-level mix-and-match lithography for random logic 0.25μm CMOS

R. Jonckheere, A. Tritchkov, V. Van Driessche, L. Van den hove

Journal:

Microelectronic Engineering

Year:

1995

Language:

english

File:

PDF, 1.20 MB

english, 1995

18

Vibration control of structures using adjustable slippage elements

Vesselin Tritchkov, George Michaelov, Shahram Sarkani

Journal:

Engineering Structures

Year:

2000

Language:

english

File:

PDF, 508 KB

english, 2000

19

Lithography simulation with aerial image — Variable threshold resist model

John Randall, Hareen Gangala, Alexander Tritchkov

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 466 KB

english, 1999

20

Feasibility of 250 nm gate patterning using i-line with OPC

V. Van Driessche, J. Finders, A. Tritchkov, K. Ronse, L. Van den hove, P. Tzviatkov

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 330 KB

english, 1998

21

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Optical Microlithography XXIV - Applicability of global source mask optimization to 22/20nm node and beyond

Tian, Kehan, Fakyry, Moutaz, Dave, Aasutosh, Tritchkov, Alexander, Tirapu-Azpiroz, Jaione, Rosenbluth, Alan E., Melville, David, Sakamoto, Masaharu, Inoue, Tadanobu, Mansfield, Scott, Wei, Alexander,

Year:

2011

Language:

english

File:

PDF, 1.38 MB

english, 2011

22

Proximity Effects Correction for Advanced Optical Lithography Processes

Tritchkov, Alexander, Finders, Jo, Randall, John, Ronse, Kurt, Vandenhove, Luc

Journal:

Japanese Journal of Applied Physics

Year:

1998

File:

PDF, 2.40 MB

1998

23

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - Lithography enabling for the 65 nm node gate layer patterning with alternating PSM

Tritchkov, Alexander, Jeong, Seongtae, Kenyon, Christopher, Smith, Bruce W.

Year:

2005

Language:

english

File:

PDF, 453 KB

english, 2005

24

0.18 μm KrF lithography using optical proximity correction based on empirical behavior modeling

Year:

1998

Language:

english

File:

PDF, 530 KB

english, 1998

25

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - Double-patterning decomposition, design compliance, and verification algorithms at 32nm hp

Tritchkov, Alexander, Glotov, Petr, Komirenko, Sergiy, Sahouria, Emile, Torres, Andres, Seoud, Ahmed, Wiaux, Vincent, Kawahira, Hiroichi, Zurbrick, Larry S.

Year:

2008

Language:

english

File:

PDF, 660 KB

english, 2008

26

SPIE Proceedings [SPIE Photomask Japan '97 - Kawasaki City, Japan (Thursday 17 April 1997)] Photomask and X-Ray Mask Technology IV - Automated OPC for application in advanced lithography

Ronse, Kurt G., Tritchkov, Alexander V., Randall, John, Jonckheere, Rik M., Ghandehari, Kouros, Van den Hove, Luc, Aizaki, Naoaki

Year:

1997

Language:

english

File:

PDF, 338 KB

english, 1997

27

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 24 February 2013)] Optical Microlithography XXVI - Inverse lithography technique for advanced CMOS nodes

Villaret, Alexandre, Conley, Will, Tritchkov, Alexander, Entradas, Jorge, Yesilada, Emek

Year:

2013

Language:

english

File:

PDF, 1.53 MB

english, 2013

28

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Understanding the parameters for strong phase-shift mask lithography

Tritchkov, Alexander V., Stirniman, John P., Mayhew, Jeffrey P., Rieger, Michael L., Progler, Christopher J.

Year:

2000

Language:

english

File:

PDF, 4.66 MB

english, 2000

29

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Optical Microlithography IX - Optical proximity effects and correction strategies for chemical-amplified DUV resists

Op de Beeck, Maaike, Bruggeman, Bert, Botermans, Harry, Van Driessche, Veerle, Yen, Anthony, Tritchkov, Alexander V., Jonckheere, Rik M., Ronse, Kurt G., Van den Hove, Luc, Fuller, Gene E.

Year:

1996

Language:

english

File:

PDF, 1.07 MB

english, 1996

30

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - Hyper-NA imaging of 45nm node random CH layouts using inverse lithography

Hendrickx, E., Tritchkov, A., Sakajiri, K., Granik, Y., Kempsell, M., Vandenberghe, G.

Year:

2008

Language:

english

File:

PDF, 822 KB

english, 2008

31

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - Pixel-based SRAF implementation for 32nm lithography process

Kim, Byung-Sung, Kawahira, Hiroichi, Zurbrick, Larry S., Kim, Yoo-Hyun, Lee, Sung-Ho, Kim, Sung-Il, Ha, Sang-Rok, Kim, Juhwan, Tritchkov, Alexander

Year:

2008

Language:

english

File:

PDF, 681 KB

english, 2008

32

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Optical Microlithography X - Optical proximity effects correction at 0.25 um incorporating process variations in lithography

Tritchkov, Alexander V., Rieger, Michael L., Stirniman, John P., Yen, Anthony, Ronse, Kurt G., Vandenberghe, Geert, Van den Hove, Luc, Fuller, Gene E.

Year:

1997

Language:

english

File:

PDF, 1.49 MB

english, 1997

33

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Optical Microlithography XII - Alternating PSM optimization using model-based OPC

Tritchkov, Alexander V., Stirniman, John P., Rieger, Michael L., Van den Hove, Luc

Year:

1999

Language:

english

File:

PDF, 3.61 MB

english, 1999

34

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XV - Yokohama, Japan (Wednesday 16 April 2008)] Photomask and Next-Generation Lithography Mask Technology XV - Model-based SRAF insertion through pixel-based mask optimization at 32nm and beyond

Sakajiri, Kyohei, Horiuchi, Toshiyuki, Tritchkov, Alexander, Granik, Yuri

Year:

2008

Language:

english

File:

PDF, 2.16 MB

english, 2008

35

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Wednesday 13 September 2000)] 20th Annual BACUS Symposium on Photomask Technology - Dual-mask model-based proximity correction for high-performance 0.10-μm CMOS process

Palmer, Shane R., Mason, Mark E., Randall, John N., Aton, Tom, Kim, Keeho, Tritchkov, Alexander V., Burdorf, James, Rieger, Michael L., Stirniman, John P., Grenon, Brian J., Dao, Giang T.

Year:

2001

Language:

english

File:

PDF, 322 KB

english, 2001

36

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Optical Microlithography IX - Top-surface imaging and optical proximity correction: a way to 0.18-um lithography at 248 nm

Goethals, Anne-Marie, Vertommen, J., Van Roey, Frieda, Yen, Anthony, Tritchkov, Alexander V., Ronse, Kurt G., Jonckheere, Rik M., Van den Hove, Luc, Fuller, Gene E.

Year:

1996

Language:

english

File:

PDF, 1.09 MB

english, 1996

37

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - AIMS-45 image validation of contact hole patterns after inverse lithography at NA 1.35

Hendrickx, E., Kawahira, Hiroichi, Zurbrick, Larry S., Birkner, R., Kempsell, M., Tritchkov, A., Vandenberghe, G., Scheruebl, T.

Year:

2008

Language:

english

File:

PDF, 434 KB

english, 2008

38

SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - Simultaneous model-based main feature and SRAF optimization for 2D SRAF implementation to 32 nm critical layers

Yehia, Ayman, Naber, Robert J., Kawahira, Hiroichi, Tritchkov, Alexander

Year:

2007

Language:

english

File:

PDF, 679 KB

english, 2007

39

[IEEE 2016 IEEE 1st International Workshops on Foundations and Applications of Self* Systems (FASW) - Augsburg, Germany (2016.9.12-2016.9.16)] 2016 IEEE 1st International Workshops on Foundations and Applications of Self Systems (FAS*W) - Verification and Validation of Decentralized, Self-Organizing Cyber-Physical Production Systems: A Blueprint Process for Testing Cyber-Physical Production Systems with Self-Properties

Tritchkov, Ivan, Goetz, Helmut

Year:

2016

Language:

english

File:

PDF, 521 KB

english, 2016